Method for stabilizing plasma ignition
US8742668B2 · kind B2 · utility
501Cited by
10References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 5, 2012 |
| Grant date | Jun 3, 2014 |
| Priority date | — |
| Expiry date | Jan 25, 2033 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32137
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method for stabilizing plasma ignition in a continuous process conducted on a substrate, includes: applying a spike of RF power between an upper electrode and a lower electrode on which the substrate is placed, wherein the spike starts from zero power, jumps to a spike power, and then drops to a base power which is so low as to cause plasma ignition failure; and continuously applying RF power at the base power between the upper and lower electrode for a duration substantially longer than a duration of the spike to process the substrate. The spike is such that ignition failure is reduced.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.