Methods and apparatus for treating exhaust gas in a processing system
US8747762B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 1, 2010 |
| Grant date | Jun 10, 2014 |
| Priority date | — |
| Expiry date | Mar 12, 2032 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02C20/30
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
Methods and apparatus for treating an exhaust gas in a foreline of a substrate processing system are provided herein. In some embodiments, an apparatus for treating an exhaust gas in a foreline of a substrate processing system includes a plasma source coupled to a foreline of a process chamber, a reagent source coupled to the foreline upstream of the plasma source, and a foreline gas injection kit coupled to the foreline to controllably deliver a gas to the foreline, wherein the foreline injection kit includes a pressure regulator to set a foreline gas delivery pressure setpoint, and a first pressure gauge coupled to monitor a delivery pressure of the gas upstream of the foreline.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.