Production method for an SiC volume monocrystal with a homogeneous lattice plane course and a monocrystalline SiC substrate with a homogeneous lattice plane course

US8747982B2 · kind B2 · utility

Assignee

• SiCrystal GMBH · DE

Inventors

• Thomas Straubinger · Steinfeld (Oldenburg), DE
• Michael Vogel · Nuremberg, DE
• Andreas Wohlfart · Erlangen, DE

Key dates

• Filing date: Dec 28, 2011
• Grant date: Jun 10, 2014
• Expiry date: Dec 28, 2031

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10T428/21
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

A method is used for producing an SiC volume monocrystal by sublimation growth. Before the beginning of growth, an SiC seed crystal is arranged in a crystal growth region of a growth crucible and powdery SiC source material is introduced into an SiC storage region of the growth crucible. During the growth, by sublimation of the powdery SiC source material and by transport of the sublimated gaseous components into the crystal growth region, an SiC growth gas phase is produced there. The SiC volume monocrystal having a central center longitudinal axis grows by deposition from the SiC growth gas phase on the SiC seed crystal. The SiC seed crystal is heated substantially without bending during a heating phase before the beginning of growth, so that an SiC crystal structure with a substantially homogeneous course of lattice planes is provided in the SiC seed crystal.