Lithographic apparatus and device manufacturing method involving fluid mixing and control of the physical property of a fluid

US8755027B2 · kind B2 · utility

Assignees

• ASML NETHERLANDS B.V. · NL
• ASML Holding N.V. · NL

Inventors

• Matthew Lipson · Sunnyvale, US
• Marcel Mathijs Theodore Marie Dierichs · Venlo, NL
• Sjoerd Nicolaas Lambertus Donders · 's-Hertogenbosch, NL
• Johannes Catharinus Hubertus Mulkens · Valkenswaard, NL
• Bob Streefkerk · Tilburg, NL
• Ronald A. Wilklow · Ridgefield, US
• Roel De Jonge · Veldhoven, NL

Key dates

• Filing date: Sep 6, 2011
• Grant date: Jun 17, 2014
• Expiry date: Sep 28, 2032

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/70341
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A fluid system to provide a fluid including liquid in a part of a lithographic apparatus, the fluid system including a manifold to mix a first liquid component and a second component to form the fluid in the part of the lithographic apparatus, a controller to control a physical property of the fluid by controlling the amount of the first and/or second component used to form the fluid, and a measuring device to measure a property of the fluid and to make feedback available to the controller, wherein the controller is configured to control the physical property of the fluid based on the measured property.