Radiation source and lithographic apparatus
US8755032B2 · kind B2 · utility
2Cited by
7References
25Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 21, 2009 |
| Grant date | Jun 17, 2014 |
| Priority date | — |
| Expiry date | Nov 28, 2030 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05G2/0094
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A radiation source is configured to generate extreme ultraviolet radiation. The radiation source includes a plasma formation site located at a position in which a fuel will be contacted by a beam of radiation to form a plasma, an outlet configured to allow gas to exit the radiation source, and a contamination trap at least partially located inside the outlet. The contamination trap is configured to trap debris particles that are generated with the formation of the plasma.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.