Patent · US Active

Particle beam system

US8759796B2 · kind B2 · utility

1Cited by

6References

16Claims

0Family size

Assignee

Carl Zeiss Microscopy GmbH · DE

Inventors

Josef Biberger · Rottenburg a. d. Laaber, DE
Ralph Pulwey · Aalen, DE

Key dates

Filing date	Feb 11, 2011
Grant date	Jun 24, 2014
Priority date	—
Expiry date	Aug 6, 2032

Classification

Technology area (CPC H)Electricity
CPC primaryH01J2237/317
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

A particle beam system includes a particle beam source for generating a particle beam, a high voltage source, a beam blanker system with deflection plates 56, 57, and a control circuit. The control circuit provides a first current path 67 between the two deflection plates, wherein a switch 70, a node 72 connected to the high voltage source and a switch 76 are arranged in this order in the first current path starting from the deflection plate 56. The control circuit provides a second current path 85 between the deflection plate 56 and the deflection plate 57, wherein in the second current path, starting from the deflection plate 56, a series connection 88 comprising a voltage source 91 a switch 90, a node 86 connected to the high voltage source and a series connection 92 comprising a voltage source 95 and a switch 94 are arranged in this order.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.