Multi-region processing system
US8770143B2 · kind B2 · utility
9Cited by
33References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 12, 2011 |
| Grant date | Jul 8, 2014 |
| Priority date | — |
| Expiry date | Aug 26, 2031 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S438/942
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The various embodiments of the invention provide for relative movement of the substrate and a process head to access the entire wafer in a minimal space to conduct combinatorial processing on various regions of the substrate. The heads enable site isolated processing within the chamber described and method of using the same are described.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.