Photomask and method for manufacturing the same
US8778570B2 · kind B2 · utility
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11Claims
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Assignee
Inventors
Key dates
| Filing date | Mar 1, 2012 |
| Grant date | Jul 15, 2014 |
| Priority date | — |
| Expiry date | Mar 1, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/44
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
According to one embodiment, a photomask includes a substrate, a film portion, a pattern, and a plurality of detection marks. The film portion is provided on a surface of the substrate. The film portion has a light transmittance lower than light transmittance of the substrate. The pattern is provided in a surface of the film portion. The pattern is configured to be transferred to a transfer target. The plurality of detection marks is provided in the film portion, with intensity of light transmitted through the detection marks being suppressed so as to suppress transfer the detection marks to the transfer target.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.