Mask set for double exposure process and method of using the mask set
US8778604B2 · kind B2 · utility
3Cited by
6References
8Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 24, 2012 |
| Grant date | Jul 15, 2014 |
| Priority date | — |
| Expiry date | Jun 15, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70466
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A mask set for double exposure process and method of using said mask set. The mask set is provided with a first mask pattern having a first base and a plurality of first teeth and protruding portions, and a second mask pattern having a second base and a plurality of second teeth, wherein the second base may at least partially overlap the first base such that each of the protruding portions at least partially overlaps one of the second teeth.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.