Electron beam detector, electron beam processing apparatus, and method of manufacturing electron beam detector
US8779378B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 15, 2013 |
| Grant date | Jul 15, 2014 |
| Priority date | — |
| Expiry date | Aug 15, 2033 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/24405
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
There is provided an electron beam detector including an electron beam scatterer which is disposed at a predetermined distance below a shield including a plurality of openings formed therein, and a beam detection element disposed at a predetermined distance below the scatterer and configured to convert an electron beam into an electric signal. In the electron beam detector, the scatterer is disposed at an equal distance from any of the openings in the shield, and the beam detection element is disposed at an equal distance from any of the openings in the shield. Thus, the electron beam detector can suppress a variation in detection sensitivity depending on the position of the opening.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.