Automatic control system for selection and optimization of co-gas flow levels
US8779395B2 · kind B2 · utility
2Cited by
1References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 1, 2011 |
| Grant date | Jul 15, 2014 |
| Priority date | — |
| Expiry date | Mar 26, 2032 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/022
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An ion implantation system for improving performance and extending lifetime of an ion source is disclosed whereby the selection, delivery, optimization and control of the flow rate of a co-gas into an ion source chamber is automatically controlled.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.