Chemical and physical templates for forming patterns using directed self-assembly materials
US8790522B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 11, 2013 |
| Grant date | Jul 29, 2014 |
| Priority date | — |
| Expiry date | Feb 11, 2033 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/0337
- WIPO fieldOther consumer goods
- WIPO sectorOther fields
Abstract
A method includes forming a chemical guide layer above a process layer. A template having a plurality of elements is formed above the process layer. The chemical guide layer is disposed on at least portions of the process layer disposed between adjacent elements of the template. A directed self-assembly layer is formed over the chemical guide layer. The directed self-assembly layer has alternating etchable components and etch-resistant components. The etchable components of the directed self-assembly layer are removed. The process layer is patterned using the template and the etch-resistant components of the directed self-assembly layer as an etch mask.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.