Immersion lithography fluid control system changing flow velocity of gas outlets based on motion of a surface
US8797500B2 · kind B2 · utility
1Cited by
18References
22Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 14, 2008 |
| Grant date | Aug 5, 2014 |
| Priority date | — |
| Expiry date | Nov 14, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70808
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An immersion lithography apparatus includes an optical member, a gap defined between the optical member and a surface disposed opposite the optical member being filled with an immersion liquid, and a fluid control device including a gas outlet through which a gas is supplied to prevent the immersion liquid from entering a surround area external to an exposure area. A flow velocity of the gas supplied from the gas outlet is controlled based on the motion of the surface such that a pressure exerted by the gas is made stronger or weaker depending on the motion of the surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.