Coating method
US8808798B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 8, 2012 |
| Grant date | Aug 19, 2014 |
| Priority date | — |
| Expiry date | Oct 2, 2032 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/027
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A coating method includes supplying a coating liquid from a coating nozzle onto a front side central portion of a substrate held on a substrate holding member, rotating the substrate holding member about a vertical axis to spread the coating liquid toward a peripheral portion of the substrate by a centrifugal force and thereby form a film of the coating liquid, forming a liquid film of a process liquid for preventing a contaminant derived from the coating liquid from being deposited or left on a back side peripheral portion of the substrate, and damping a vertical wobble of the peripheral portion of the substrate being rotated, by a posture regulating mechanism, while delivering a gas from delivery holes onto a back side region of the substrate on an inner side of the peripheral portion on which the liquid film is formed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.