Lithographic apparatus, removable member and device manufacturing method
US8823919B2 · kind B2 · utility
4Cited by
3References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 15, 2010 |
| Grant date | Sep 2, 2014 |
| Priority date | — |
| Expiry date | Aug 4, 2031 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/2852
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A member is provided to prevent immersion liquid ingress to a gap between components or to adhere to at least one component to provide a surface to a feature of an immersion system. The member has a plastic sealing portion that is adhered to the component(s). The plastic sealing portion is opaque to DUV radiation. It may be resistant to degradation through exposure to DUV radiation. It may have a liquid phobic coating or property.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.