Patent · US Active

Wafer's ambiance control

US8827695B2 · kind B2 · utility

12Cited by
6References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMay 5, 2009
Grant dateSep 9, 2014
Priority date
Expiry dateApr 23, 2032

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S414/135
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A semiconductor manufacturing system, an interface system, a carrier, and a method for providing an ambient controlled environment is disclosed. The semiconductor manufacturing system comprises a plurality of process chambers; at least one interface system, wherein the interface system includes a first ambient control element; at least one carrier, wherein the carrier comprises a second ambient control element; and a control module coupled to the plurality of process chambers, the at least one interface system, and the at least one carrier.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.