Neutral layer polymer composition for directed self assembly and processes thereof

US8835581B2 · kind B2 · utility

Assignee

• AZ Electronic Materials (Luxembourg) S.A.R.L. · LU

Inventors

• Hengpeng Wu
• Orest Polishchuk · Bayonne, US
• Yi Cao · Parsippany, US
• SungEun Hong · Berkeley Heights, US
• Jian Yin · Bound Brook, US
• Guanyang Lin · Whitehouse Station, US
• Margareta Paunescu · Clinton, US
• Mark Neisser · Whitehouse Station, US

Key dates

• Filing date: Jun 8, 2012
• Grant date: Sep 16, 2014
• Expiry date: Nov 10, 2032

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C08F2810/40
• WIPO field: Macromolecular chemistry, polymers
• WIPO sector: Chemistry

Abstract

The present invention relates to a novel polymeric composition comprising a novel polymer having two or more repeat units and a terminus having the structure (1):wherein R1 represents a C1-C20 substituted or unsubstituted alkyl group, w is a number from 1-8, X is oxygen (O) or nitrogen (N), and Rd is a reactive group. The invention also relates to a process for forming a pattern using the novel polymeric composition. The invention further relates to a process of making the novel polymer.