Patent · US Active

Flow passage switching apparatus, processing apparatus, flow passage switching method, processing method and storage medium

US8840752B2 · kind B2 · utility

2Cited by
3References
6Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 15, 2011
Grant dateSep 23, 2014
Priority date
Expiry dateOct 14, 2032

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T137/87877
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

Disclosed are a flow path switching apparatus and a fluid processing apparatus having a liquid processing unit that performs a processing by supplying different kinds of processing fluid to wafer W at different timings. The atmosphere of the liquid processing unit is discharged fluid to a plurality of exclusive exhaust paths through exhaust paths and flow path switching units. A flow path switching unit includes an outer tube having a plurality of connection holes and a rotary tube inserted into the outer tube having a plurality of openings. In particular, one of the plurality of openings of the rotary tube is aligned with one of the plurality of connection holes of the outer tube in such a way that only an aligned set of an opening of the rotary tube and a connection hole of the outer tube is sequentially communicated during the rotation of the rotary tube.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.