Positive working photosensitive material
US8841062B2 · kind B2 · utility
4Cited by
2References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 4, 2012 |
| Grant date | Sep 23, 2014 |
| Priority date | — |
| Expiry date | Dec 4, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0397
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Disclosed herein is a photosensitive composition comprising a heterocyclic thiol compound or tautomeric form thereof and its method of use on a substrate, which may include a chalcophile substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.