Gas supplying apparatus, cylinder cabinet provided with the same, valve box, and substrate process apparatus
US8851106B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Mar 1, 2012 |
| Grant date | Oct 7, 2014 |
| Priority date | — |
| Expiry date | Jan 10, 2033 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T137/7762
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A disclosed gas supplying apparatus includes a pressure controller that reduces a primary pressure thereby providing a secondary pressure greater than a process pressure at which a predetermined process is performed and less than the atmospheric pressure in a secondary pipe; a pressure sensor that measures a pressure in the secondary pipe; a first open/close valve provided in the secondary pipe; an open/close valve controller that opens or closes the first open/close valve; a pressure comparator that compares the pressure measured by the pressure sensor in the secondary pipe with a first set pressure that is greater than the process pressure by a predetermined pressure; and a controller that outputs a signal to the open/close valve controller thereby closing the first open/close valve, when the pressure comparator determines that the pressure in the secondary pipe is less than the first set pressure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.