Patent · US Active

Substrate processing apparatus

US8851819B2 · kind B2 · utility

17Cited by

15References

3Claims

0Family size

Assignee

TOKYO ELECTRON LIMITED · JP

Inventors

Yuji Kamikawa · Tosu, JP
Takafumi Tsuchiya · Tosu, JP
Koji Egashira · Tosu, JP

Key dates

Filing date	Feb 17, 2010
Grant date	Oct 7, 2014
Priority date	—
Expiry date	Jun 14, 2031

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY10S414/14
WIPO fieldSemiconductors
WIPO sectorElectrical engineering

Abstract

A substrate processing apparatus, which utilizes a first transfer apparatus and a second transfer apparatus which are configured to transfer a transfer container containing a plurality of substrates, along a first transfer path and a second transfer path whose lateral positions differ from each other, respectively, including a first load port where the transfer container is loaded and unloaded by the first transfer apparatus, and a second load port that is arranged stepwise with respect to the first load port, with the transfer container being loaded to and unloaded from the second load port by the second transfer apparatus.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.