6 KHz and above gas discharge laser system
US8855166B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 17, 2012 |
| Grant date | Oct 7, 2014 |
| Priority date | — |
| Expiry date | Jan 17, 2032 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S3/2308
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A system and method of operating a high repetition rate gas discharge laser system. The system includes a gas discharge chamber having a hot chamber output window heated by the operation of the gas discharge laser chamber, an output laser light pulse beam path enclosure downstream of the hot chamber window and comprising an ambient temperature window, a cooling mechanism cooling the beam path enclosure intermediate the output window and the ambient window. The gas discharge chamber can include a longitudinally and axially compliant ground rod, including a first end connected to a first chamber wall, a second end connected to a second chamber wall, the second chamber wall opposite the first chamber wall and a first portion formed into a helical spring, the ground rod providing mechanical support for a preionizer tube.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.