Lithographic apparatus and device manufacturing method
US8860926B2 · kind B2 · utility
0Cited by
32References
20Claims
0Family size
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Key dates
| Filing date | Sep 22, 2011 |
| Grant date | Oct 14, 2014 |
| Priority date | — |
| Expiry date | Aug 17, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/709
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithographic apparatus for immersion lithography is disclosed in which a seal between different parts of the substrate table may be arranged to reduce the transmission of forces between the different parts.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.