Substrate processing apparatus and substrate processing method
US8865483B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 1, 2013 |
| Grant date | Oct 21, 2014 |
| Priority date | — |
| Expiry date | Aug 1, 2033 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2924/0002
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Provided is a substrate processing apparatus in which flexibility of disposing a device configured to determine a holding state of a substrate and the flexibility of timing of determining the holding state are enhanced. The substrate processing apparatus includes a light projector configured to radiate detection light toward a region where a substrate may exist when the substrate is held by a substrate holding member and a light receiver configured to receive the detection light radiated from the light projector. A light path of the detection light from the light projector toward the light receiver passes a substrate surrounding member installed around the substrate held by the substrate holding member. The detection light penetrates the substrate surrounding member and has a wavelength which does not penetrate the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.