Methods of forming bonded semiconductor structures
US8866305B2 · kind B2 · utility
9Cited by
3References
21Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 9, 2013 |
| Grant date | Oct 21, 2014 |
| Priority date | — |
| Expiry date | Jul 9, 2033 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2924/14
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Methods of forming bonded semiconductor structures include temporarily, directly bonding together semiconductor structures, thinning at least one of the semiconductor structures, and subsequently permanently bonding the thinned semiconductor structure to another semiconductor structure. The temporary, direct bond may be established without the use of an adhesive. Bonded semiconductor structures are fabricated in accordance with such methods.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.