Excimer laser apparatus and excimer laser system
US8867583B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 22, 2012 |
| Grant date | Oct 21, 2014 |
| Priority date | — |
| Expiry date | Oct 22, 2032 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S3/08009
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An excimer laser apparatus includes a gas supply unit, connected to a first receptacle that holds a first laser gas containing halogen gas and a second receptacle that holds a second laser gas having a lower halogen gas concentration than the first laser gas, that supplies the first laser gas and the second laser gas to the interior of the laser chamber. Gas pressure control in which the gas supply unit supplies the second laser gas to the interior of the laser chamber or a gas exhaust unit partially exhausts gas from within the laser chamber, and partial gas replacement control in which the gas supply unit supplies the first laser gas and the second laser gas to the interior of the laser chamber and the gas exhaust unit partially exhausts gas from within the laser chamber sequentially, may be selectively performed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.