Method of forming pattern, reticle, and computer readable medium for storing program for forming pattern
US8871104B2 · kind B2 · utility
16Cited by
8References
25Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 30, 2011 |
| Grant date | Oct 28, 2014 |
| Priority date | — |
| Expiry date | May 21, 2032 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S438/947
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A method of forming a pattern includes forming a plurality of target patterns, forming a plurality of pitch violating patterns that make contact with the plurality of target patterns and are disposed between the plurality of target patterns, classifying the plurality of pitch violating patterns into a first region and a second region adjacent to the first region, and forming an initial pattern corresponding to one of the first region and the second region.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.