Patent · US Active

Using vacuum ultra-violet (VUV) data in microwave sources

US8877080B2 · kind B2 · utility

9Cited by

15References

17Claims

0Family size

Assignee

TOKYO ELECTRON LIMITED · JP

Inventors

Lee Chen · Mabank, US
Jianping Zhao · Xi'an, CN

Key dates

Filing date	Oct 18, 2011
Grant date	Nov 4, 2014
Priority date	—
Expiry date	Feb 11, 2033

Classification

Technology area (CPC H)Electricity
CPC primaryH01J2237/334
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

The invention provides an apparatus and methods for creating gate structures on a substrate in real-time using Vacuum Ultra-Violet (VUV) data and Electron Energy Distribution Function (EEDf) data and associated (VUV/EEDf)-related procedures in (VUV/EEDf) etch systems. The (VUV/EEDf)-related procedures can include multi-layer-multi-step processing sequences and (VUV/EEDf)-related models that can include Multi-Input/Multi-Output (MIMO) models.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.