Substrate liquid processing apparatus, method of controlling substrate liquid processing apparatus, and storage medium performing substrate liquid processing apparatus control method on substrate liquid processing apparatus
US8881751B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 2, 2011 |
| Grant date | Nov 11, 2014 |
| Priority date | — |
| Expiry date | Nov 22, 2032 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T137/8593
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A substrate liquid processing apparatus includes a placement table configured to hold a substrate, a rotary driving unit configured to rotate the placement table, a liquid supply unit configured to supply a liquid to the substrate placed on the placement table, and an upper liquid guide cup, a central liquid guide cup, and a lower liquid guide cup which are disposed in this order from the top and are configured to guide downward the liquid scattering from the rotating substrate being placed on the placement table. A driving mechanism is configured to move up and down the upper liquid guide cup, the central liquid guide cup, and the lower liquid guide cup. The driving mechanism is connected to the central liquid guide cup.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.