Compositions and processes for photolithography
US8883400B2 · kind B2 · utility
2Cited by
2References
16Claims
0Family size
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Key dates
| Filing date | Jul 13, 2012 |
| Grant date | Nov 11, 2014 |
| Priority date | — |
| Expiry date | Jul 13, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/11
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Topcoat layer compositions are provided that are applied above a photoresist composition. The compositions find particular applicability to immersion lithography processing.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.