Chamber apparatus and extreme ultraviolet light generation system
US8884257B2 · kind B2 · utility
1Cited by
1References
9Claims
0Family size
Assignee
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Key dates
| Filing date | Jul 31, 2012 |
| Grant date | Nov 11, 2014 |
| Priority date | — |
| Expiry date | Sep 3, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG21K5/00
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
A chamber apparatus, which may be used with an external apparatus having an obscuration region, may include: a chamber in which EUV light is generated; a collector mirror having a first through-hole formed in a region aside from the center thereof and configured to collect the EUV light generated inside the chamber, the collector mirror being positioned such that the first through-hole is located in a region substantially corresponding to the obscuration region; and an etching gas supply unit provided in the first through-hole and configured to supply an etching gas into the chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.