Optical element and method

US8891172B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Eric Eva · Aalen, DE
• Payam Tayebati · Ulm, DE
• Michael Thier · Heubach, DE
• Markus Hauf · Ulm, DE
• Ulrich Schoenhoff · Ulm, DE
• Ole Fluegge · Heubach, DE
• Arif Kazi · Aalen, DE
• Alexander Sauerhoefer · Hamburg, DE
• Gerhard Focht · Wilmsdorf, DE
• Jochen Weber · Laufenbürg, DE
• Toralf Gruner · Hennef (Sieg), DE

Key dates

• Filing date: Mar 11, 2009
• Grant date: Nov 18, 2014
• Expiry date: Mar 11, 2029

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/70266
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

The disclosure relates to an optical element configure to at least partial spatially resolve correction of a wavefront aberration of an optical system (e.g., a projection exposure apparatus for microlithography) to which optical radiation can be applied, as well as related systems and methods.