Source-collector modules for EUV lithography employing a GIC mirror and a LPP source

US8895946B2 · kind B2 · utility

Assignee

• MEDIA LARIO S.R.L. · IT

Inventors

• Natale M. Ceglio · Pleasanton, US
• Daniel Stearns · Mountain View, US
• Jacques Kools · Fremont, US
• Giuseppe Valsecchi · Oggiono, IT
• Fabio Zocchi · Samarate, IT
• Riccardo Binda · Erba, IT

Key dates

• Filing date: Feb 7, 2013
• Grant date: Nov 25, 2014
• Expiry date: Feb 7, 2033

Classification

• Technology area (CPC H): Electricity
• CPC primary: H05G2/0094
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

Source-collector modules for use with EUV lithography systems are disclosed, wherein the source-collector modules employ a laser-produced plasma EUV radiation source and a grazing-incidence collector. The EUV radiation source is generated by first forming an under-dense plasma, and then irradiating the under-dense plasma with infrared radiation of sufficient intensity to create a final EUV-emitting plasma. The grazing incidence collector can include a grating configured to prevent infrared radiation from reaching the intermediate focus. Use of debris mitigation devices preserves the longevity of operation of the source-collector modules.