Photoacid generator and photoresist comprising same

US8900794B2 · kind B2 · utility

Assignee

• Rohm and Haas Electronic Materials LLC · US

Inventors

• Emad Aqad · Northborough, US
• Cheng-Bai Xu · Upton, US
• Mingqi Li · Sammamish, US
• Shintaro Yamada · Shrewsbury, US
• William Williams, III · Ipswich, US

Key dates

• Filing date: Sep 28, 2012
• Grant date: Dec 2, 2014
• Expiry date: Sep 28, 2032

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C07C2603/74
• WIPO field: Organic fine chemistry
• WIPO sector: Chemistry

Abstract

A photoacid generator compound has the formula (I):[A-(CHR1)p]k-(L)-(CH2)m—(C(R2)2)n—SO3−Z+  (I)wherein A is a substituted or unsubstituted, monocyclic, polycyclic, or fused polycyclic C5 or greater cycloaliphatic group optionally comprising O, S, N, F, or a combination comprising at least one of the foregoing, R1 is H, a single bond, or a substituted or unsubstituted C1-30 alkyl group, wherein when R1 is a single bond, R1 is covalently bonded to a carbon atom of A, each R2 is independently H, F, or C1-4 fluoroalkyl, wherein at least one R2 is not hydrogen, L is a linking group comprising a sulfonate group, a sulfonamide group, or a C1-30 sulfonate or sulfonamide-containing group, Z is an organic or inorganic cation, p is an integer of 0 to 10,k is 1 or 2, m is an integer of 0 or greater, and n is an integer of 1 or greater. A precursor compound to the photoacid generator, a photoresist composition including the photoacid generator, and a substrate coated with the photoresist composition, are also disclosed.