Patent · US Active

Negative-working thick film photoresist

US8906594B2 · kind B2 · utility

5Cited by

11References

12Claims

0Family size

Assignee

AZ Electronic Materials (Luxembourg) S.A.R.L. · LU

Inventors

Chunwei Chen · Piscataway, US
PingHung Lu · Bound Brook, US
Weihong Liu · Carp, CA
Medhat A. Toukhy · Barrington, US
Sangchul Kim · Seoul, KR
SookMee Lai · Kakegawa, JP

Key dates

Filing date	Jun 15, 2012
Grant date	Dec 9, 2014
Priority date	—
Expiry date	Jun 15, 2032

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC08F220/1805
WIPO fieldOptics
WIPO sectorInstruments

Abstract

Disclosed are compositions for negative-working thick film photophotoresists based on acrylic co-polymers. Also included are methods of using the compositions.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.