Plasma generator systems and methods of forming plasma
US8916022B1 · kind B1 · utility
20Cited by
35References
20Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Sep 12, 2008 |
| Grant date | Dec 23, 2014 |
| Priority date | — |
| Expiry date | Jun 22, 2033 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32477
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Systems and methods of forming plasma are provided. In an embodiment, by way of example only, a plasma generation system includes a container comprising an insulating material, a means for forming a first plasma within the container from a processing gas, the first plasma including charged particles, a means for extracting a portion of the charged particles from the first plasma and storing the portion of extracted charged particles on the insulating material, and a means for forming a second plasma from the extracted portion of the charged particles and a second portion of the processing gas.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.