Patent · US Active

Adhesion between post-passivation interconnect structure and polymer

US8916972B2 · kind B2 · utility

12Cited by
2References
20Claims
0Family size

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Inventors

Key dates

Filing dateMar 13, 2013
Grant dateDec 23, 2014
Priority date
Expiry dateMar 13, 2033

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L2924/18162
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

An embodiment integrated circuit structure includes a substrate, a metal pad over the substrate, a post-passivation interconnect (PPI) structure over the substrate and electronically connected to the metal pad, a thin oxide film layer directly over a top surface of the PPI structure, and a polymer layer over the thin oxide film layer and PPI structure.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.