High efficiency gas dissociation in inductively coupled plasma reactor with improved uniformity
US8920599B2 · kind B2 · utility
1Cited by
1References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 11, 2011 |
| Grant date | Dec 30, 2014 |
| Priority date | — |
| Expiry date | Jun 10, 2032 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3211
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Embodiments of the present invention relate to a plasma chamber having a coil assembly which improves plasma uniformity and improves power coupling to the plasma. One embodiment provides a plasma chamber. The plasma chamber includes a chamber body having sidewalls and a lid, wherein the chamber body defines a processing volume. The plasma chamber further includes a coil assembly disposed over the lid configured to generate inductively coupled plasma within the processing volume, wherein the coil assembly comprises two or more horizontal coils arranged in a common horizontal plane.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.