Patent · US Active

Ion beam system and method of operating an ion beam system

US8921805B2 · kind B2 · utility

0Cited by

6References

16Claims

0Family size

Assignee

Carl Zeiss Microscopy GmbH · DE

Inventors

Josef Biberger · Rottenburg a. d. Laaber, DE
Ralph Pulwey · Aalen, DE
Andreas Adolf · Aalen, DE

Key dates

Filing date	Mar 18, 2014
Grant date	Dec 30, 2014
Priority date	—
Expiry date	Mar 18, 2034

Classification

Technology area (CPC H)Electricity
CPC primaryH01J2237/31749
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

An ion beam system comprises a voltage supply system 7 and at least one beam deflector 39 having at least one first deflection electrode 51a, 51b, 51c and plural second deflection electrodes 52a, 52b, 52c, wherein the voltage supply system is configured to supply different adjustable deflection voltages to the plural second deflection electrodes such that electric deflection fields between the plural second deflection electrodes and the opposite at least one first deflection electrode have a common orientation. The system has a high kinetic energy mode in which a distribution of the electric deflection field has a greater width, a low kinetic energy mode in which a distribution of the electric deflection field has a smaller width.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.