Target for laser produced plasma extreme ultraviolet light source
US8927952B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 10, 2014 |
| Grant date | Jan 6, 2015 |
| Priority date | — |
| Expiry date | Jan 10, 2034 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05G2/0086
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
Techniques for generating EUV light include directing a first pulse of radiation toward a target material droplet to form a modified droplet, the first pulse of radiation having an energy sufficient to alter a shape of the target material droplet; directing a second pulse of radiation toward the modified droplet to form an absorption material, the second pulse of radiation having an energy sufficient to change a property of the modified droplet, the property being related to absorption of radiation; and directing an amplified light beam toward the absorption material, the amplified light beam having an energy sufficient to convert at least a portion of the absorption material into extreme ultraviolet (EUV) light.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.