System for attachment of an electrode into an inductively coupled plasma source

US8928210B2 · kind B2 · utility

Assignee

• FEI Company · US

Inventors

• Sean Kellogg · Portland, US
• Anthony Graupera · Hillsboro, US
• N. William Parker · Fairfield, US
• Andrew B. Wells · Portland, US
• Mark W. Utlaut · Scappoose, US
• Walter Skoczylas · Beaverton, US
• Gregory A. Schwind · Portland, US
• Shouyin Zhang · Livermore, US
• Noel Smith · Lake Oswego, US

Key dates

• Filing date: Nov 30, 2011
• Grant date: Jan 6, 2015
• Expiry date: Oct 11, 2032

Classification

• Technology area (CPC —): General

Abstract

An inductively coupled plasma charged particle source for focused ion beam systems includes a plasma reaction chamber with a removably attached source electrode. A fastening mechanism connects the source electrode with the plasma reaction chamber and allows for a heat-conductive, vacuum seal to form. With a removable source electrode, improved serviceability and reuse of the plasma source tube are now possible.