N. William Parker
50Patents
15h-index
46Co-inventors
84Inventor score
Filing activity: Oct 19, 1992 → Feb 21, 2018
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5429070A | High density plasma deposition and etching apparatus | Electricity | 196 | Expired |
| US6844550B1 | Multi-beam multi-column electron beam inspection system | Electricity | 116 | Expired |
| US5421891A | High density plasma deposition and etching apparatus | Electricity | 99 | Expired |
| US6617587B2 | Electron optics for multi-beam electron beam lithography tool | Electricity | 68 | Expired |
| US6777675B2 | Detector optics for electron beam inspection system | Electricity | 33 | Expired |
| US6977375B2 | Multi-beam multi-column electron beam inspection system | Electricity | 33 | Expired |
| US6734428B2 | Multi-beam multi-column electron beam inspection system | Electricity | 31 | Expired |
| US6943351B2 | Multi-column charged particle optics assembly | Electricity | 28 | Expired |
| US6872958B2 | Platform positioning system | Emerging Cross-Sectional Technologies | 20 | Expired |
| US6738506B2 | Image processing system for multi-beam inspection | Physics | 20 | Expired |
| US7462848B2 | Optics for generation of high current density patterned charged particle beams | Electricity | 19 | Active |
| US7227142B2 | Dual detector optics for simultaneous collection of secondary and backscattered electrons | Electricity | 17 | Expired |
| US7122795B2 | Detector optics for charged particle beam inspection system | Electricity | 16 | Expired |
| US9934930B2 | High aspect ratio x-ray targets and uses of same | Electricity | 16 | Active |
| US7435956B2 | Apparatus and method for inspection and testing of flat panel display substrates | Electricity | 16 | Expired |
| US8283629B1 | Aberration-corrected wien ExB mass filter with removal of neutrals from the Beam | Electricity | 15 | Active |
| US8314410B2 | Combination laser and charged particle beam system | Electricity | 15 | Active |
| US7928404B2 | Variable-ratio double-deflection beam blanker | Electricity | 15 | Active |
| US7456402B2 | Detector optics for multiple electron beam test system | Electricity | 14 | Active |
| US7786454B2 | Optics for generation of high current density patterned charged particle beams | Electricity | 14 | Active |
| US7941237B2 | Flat panel display substrate testing system | Physics | 12 | Active |
| US8242457B2 | Charged particle optics with azimuthally-varying third-order aberrations for generation of shaped beams | Electricity | 10 | Active |
| US8319181B2 | System and method for localization of large numbers of fluorescent markers in biological samples | Electricity | 9 | Active |
| US5637951A | Electron source for multibeam electron lithography system | Electricity | 9 | Expired |
| US8678049B2 | Method and structure for prevention of incorrect fueling operations for diesel-powered vehicles | Emerging Cross-Sectional Technologies | 9 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.