Contact power rail
US8946914B2 · kind B2 · utility
6Cited by
2References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 4, 2013 |
| Grant date | Feb 3, 2015 |
| Priority date | — |
| Expiry date | Mar 4, 2033 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D84/981
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A method for forming CA power rails using a three mask decomposition process and the resulting device are provided. Embodiments include forming a horizontal diffusion CA power rail in an active layer of a semiconductor substrate using a first color mask; forming a plurality of vertical CAs in the active layer using second and third color masks, the vertical CAs connecting the CA power rail to at least one diffusion region on the semiconductor substrate, spaced from the CA power rail, wherein each pair of CAs formed by one of the second and third color masks are separated by at least two pitches.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.