Patent · US Active

Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method

US8947629B2 · kind B2 · utility

0Cited by

73References

46Claims

0Family size

Assignee

ASML NETHERLANDS B.V. · NL

Inventors

Anthonius Martinus Cornelis Petrus De Jong · Pijnacker, NL
Hans Jansen · Eindhoven, NL
Marco Koert Stavenga · Eindhoven, NL
Peter Franciscus Wanten · Mierlo, NL
Bauke Jansen · Deurne, NL
Johannes Wilhelmus Jacobus Leonardus Cuijpers · Roermond, NL
Raymond Gerardus Marius Beeren · Dalhem, BE
Kornelis Tijmen Hoekerd · Eindhoven, NL

Key dates

Filing date	Apr 11, 2008
Grant date	Feb 3, 2015
Priority date	—
Expiry date	Mar 17, 2030

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70341
WIPO fieldOptics
WIPO sectorInstruments

Abstract

An immersion lithographic projection apparatus having a megasonic transducer configured to clean a surface and a method of using megasonic waves through a liquid to clean a surface of an immersion lithographic projection apparatus are disclosed. A flow, desirably a radial flow, is induced in the liquid.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.