Lithographic apparatus and device manufacturing method
US8947637B2 · kind B2 · utility
4Cited by
28References
36Claims
0Family size
Assignee
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Key dates
| Filing date | Sep 6, 2011 |
| Grant date | Feb 3, 2015 |
| Priority date | — |
| Expiry date | Aug 30, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/7088
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithographic apparatus is provided that has a sensor at substrate level, the sensor including a radiation receiver, a transmissive plate supporting the radiation receiver, and a radiation detector, wherein the sensor is arranged to avoid loss of radiation between the radiation receiver and a final element of the radiation detector.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.