Lithographic apparatus, drying device, metrology apparatus and device manufacturing method
US8953142B2 · kind B2 · utility
3Cited by
1References
23Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 18, 2009 |
| Grant date | Feb 10, 2015 |
| Priority date | — |
| Expiry date | Nov 16, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70341
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
An immersion lithographic apparatus is described in which a two-phase flow is separated into liquid-rich and gas-rich flows by causing the liquid-rich flow to preferentially flow along a surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.