Asymmetric templates for forming non-periodic patterns using directed self-assembly materials
US8956808B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 4, 2012 |
| Grant date | Feb 17, 2015 |
| Priority date | — |
| Expiry date | Jan 24, 2033 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0002
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method includes forming a template having a plurality of elements above a process layer, wherein portions of the process layer are exposed between adjacent elements of the template. A directed self-assembly layer is formed over the exposed portions. The directed self-assembly layer has alternating etchable components and etch-resistant components. The etchable components of the directed self-assembly layer are removed. The process layer is patterned using the template and the etch-resistant components of the directed self-assembly layer. Non-periodic elements are defined in the process later by the template and periodic elements are defined in the process layer by the etch-resistant components of the directed self-assembly layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.