Laser and plasma etch wafer dicing with a double sided UV-curable adhesive film
US8969177B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 13, 2013 |
| Grant date | Mar 3, 2015 |
| Priority date | — |
| Expiry date | Jun 13, 2033 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2221/68327
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
Laser and plasma etch wafer dicing using UV-curable adhesive films. A mask is formed covering ICs formed on the wafer, as well as any bumps providing an interface to the ICs. The semiconductor wafer is coupled to a carrier substrate by a double-sided UV-curable adhesive film. The mask is patterned by laser scribing to provide a patterned mask with gaps. The patterning exposes regions of the semiconductor wafer, below thin film layers from which the ICs are formed. The semiconductor wafer is then etched through the gaps in the patterned mask to singulate the ICs. The UV-curable adhesive film is partially cured by UV irradiation through the carrier. The singulated ICs are then detached from the partially cured adhesive film still attached to the carrier substrate, for example individually by a pick and place machine. The UV-curable adhesive film may then be further cured for the film's complete removal from the carrier substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.