Test structure and method to facilitate development/optimization of process parameters
US8975094B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 21, 2013 |
| Grant date | Mar 10, 2015 |
| Priority date | — |
| Expiry date | Jan 21, 2033 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L22/12
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A test structure and method are provided to facilitate developing or optimizing a fabrication process by determining values of one or more lithography process parameters for use in semiconductor device fabrication. The test structure is configured to facilitate determining values of the one or more fabrication process parameters, and includes a plurality of test structure components arranged on a substrate according to a test pattern. The test pattern may be based on: varying distances between the test structure components according to a first rule; varying distances between centers of the test structure components according to a second rule; and/or varying at least one dimension of the test structure components according to a third rule. The method may further include determining dimensions of one or more components of the test structure using, for example, scatterometry, and using the dimensions of the components to ascertain one or more fabrication process parameters.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.