Patent · US Active

Apparatus and method for detecting a state of a deposition apparatus

US8980071B2 · kind B2 · utility

0Cited by

2References

11Claims

0Family size

Assignee

Applied Materials, Inc. · US

Inventors

Guido Mahnke · Wiesbaden, DE
Bernhard Stock · Adelschlag, DE
Markus Hanika · Landsberg, DE
Ferdinand Füller · Hanau, DE

Key dates

Filing date	Aug 27, 2010
Grant date	Mar 17, 2015
Priority date	—
Expiry date	Apr 2, 2031

Classification

Technology area (CPC H)Electricity
CPC primaryH01J37/3444
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

Apparatuses for deposition of one or more layers. In one aspect, an apparatus for deposition of one or more layers includes an anode; a cathode; a vacuum chamber including the anode and the cathode; a sensor configured to detect an electric potential between a section of the at least one anode and a section of the chamber. Furthermore, methods to monitor a device for deposition of one or more layers are also described.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.